Re: [Libre-silicon-devel] Silicide formation

Hi from Hong Kong ;-)

Today I found the solution for our problem (on page 443): https://www.researchgate.net/publication/235643063_Reduction_of_the_C49-C54_...

We've got to anneal our wafer after the C49 formation for at least 42 minutes at at least 725 degree Celsius.

So tomorrow, we prepare a sample and process it this way.

I guess the Mumble session tonight will be pretty short anyway ;-)

Cheers David

Hi from San Diego!

I'll probably just have arrived in Oslo for a trial lecture (subject: How to deal with mismatch in IC design processes) and will be too busy travelling to make it to the Mumble ...