Hi all, hi Hagen Today I've received the RFID card for the lab, which means I can go in there whenever I want now :-)
Following things have come up so far: a) We need additional pwell in the cell layouts, because we need to lift the potential/doping of the p-substrate and I wanna keep the higher resistance in the non active areas. Also the process contains a step for building in pwells so that in case someone wants to use n-substrate or undoped substrate, they can just change the doping parameters. b) I've now figured out how to map the layers from MOSIS to GDS2 so that we can build it with our process.
For instance ptransistor and ntransistor are both included in both masks: The poly-mask together with polysilicon as well as the pimplant mask/nimplant mask. Also we will have to include the pdcontact within the pimplant mask.
@Hagen: Can you add pwells into the standard cells? Then we can actually just use MOSIS and merge the layers accordingly to our process.
I'm now fixing up some details about our process, like the Aluminum and isolation oxide layer thicknesses and then we can generate GDS2 files from your layout, upload the GDS2 to the web interface, pay the mask set and get started in the lab.
Cheers David