Hello Everyone!
Wrap-up: Google and Skywater partner up to provide an open-source PDK (incl. primitive library and models, mostly what we do) for an actually existing technology node.
Compared to LS1U, MFS is 130nm, voltage range is 1,8V core + 3,3-5V IO, HV MOS and SONOS is also available. What seem to be differentiating factors are:
- Only the PDK is open, the process steps not. Proprietary single-source tech. with no geographical diversity
- Commercial mask-based volume-optimized foundry with the usual pain-in-the-ass for MPW projects (expensive for the general public, takes too long)
- Made-in-USA with DoD accreditation (can attract US govt customers, but hmm-hmm... otherwise)
At the end, if we wish to underline the importance and necessity of our work, we may need to put more emphasis on maskless lithography and a business model geared towards unique, fast, cheap (i.e. comparable to a catalog component) single-piece orders.
Regards,
Ferenc