Few ideas from me,

If you are going to stick with 360nm light for now, regular fused silica should not absorbing it that much. DUV litho needs 200w+ light sources because their optics is way more massive and more complex.

Have you thought of making something like a microled matrix? Getting 50w from it onto the wafer with liquid cooling, and simple optics should be real.

On Sun, Feb 23, 2020 at 8:06 PM Staf Verhaegen <staf@fibraservi.eu> wrote:
David Lanzendörfer schreef op ma 24-02-2020 om 00:42 [+0800]:
Hi
I'm apparently not the first one with the idea to use a DMD chip and an UV
light source for exposure:
https://www.researchgate.net/figure/Layout-for-UV-based-DMD-system-If-the-illumination-is-in-the-UV-spectrum-then-it-must_fig4_50395785

Also Sam Zeloof has made his own chip with a DLP projector:
http://sam.zeloof.xyz/maskless-photolithography/

greets,
Staf.

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