Checking it promptly.
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-------- Original Message -------- On Aug 11, 2021, 12:51, David Lanzendörfer wrote:
Hi Dilek, hi list Sorry again about the downtime of the infrastructure during the day yesterday. The infrastructure of the data center I've got my rack server in was down.
Now to the topic: I've started writing down the BOM and I'm not sure whether 420 nm UV already has too much energy, although the data sheet of the DMD chip says it's ok to be operated until 400nm.
Here's the BOM: https://redmine.libresilicon.com/projects/maskless-lithography/wiki
It would be cool to get feedback on that from Texas Instruments.
Cheers David
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