Hi everyone

So last Sunday, Ferenc and I brainstormed on how to achieve smaller feature

sizes with a UV wave length, which limits us to 400nm or so.

We discussed splitting a lower feature size layout into multiple masks

and then doing overlapping exposure steps.

Ferenc pointed out, that we might run into an offset issue.

I've been thinking about this for a while and the solution came to me on the 

toilet just now, and it's actually surprisingly simple.

Since we're using a DMD and not physical masks, we can do the multiple 

exposure steps all at once, without any stepping in between.

while(!eow()) { // end of wafer

expose_mask(1);

expose_mask(2);

step_to_next();

}