[Libre-silicon-devel] RCL cross verification

Hi List So I've sent out an email to the factory over in Tai Po and asked them whether we could cross verify our process with their machines, but I'm still waiting for an answer from Philip, whether they've got time right now. I suspect the problems with the faulty nitride side walls which led to the leakage between drain gate source arose from the unreliable and fluctuating ICP angle of the NFF RIE. Unfortunately, all the other nitride dry etchers are broken at NFF, so I have not other machines to test it out there.

I'll keep you all in the loop

-lev