Stepper resolution
Hi So turns out there's another way to achieve higher resolutions (below 100nm), without having to use EUV light and low pressure. You can give your exposure unit a nice bath :-) https://en.wikipedia.org/wiki/Immersion_lithography What do you folks think? Worth considering putting on our TODO list for future stepper iterations? Cheers -lev
Atm, the project is light years away from when air in between lens, and the die is a problem. Before you will run out of raw numeric aperture, things like temperature control, nanometric precision overlay etc, etc, etc will have to be solved first. Pavel Nikulin Software Engineer +7 702 851 0788 pavel@noa-labs.com On Fri, Apr 16, 2021 at 1:05 AM David Lanzendörfer <leviathan@libresilicon.com> wrote:
Hi So turns out there's another way to achieve higher resolutions (below 100nm), without having to use EUV light and low pressure. You can give your exposure unit a nice bath :-) https://en.wikipedia.org/wiki/Immersion_lithography
What do you folks think? Worth considering putting on our TODO list for future stepper iterations?
Cheers -lev
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Agreed On Friday, April 16, 2021 12:51:07 PM WEST Pavel Nikulin wrote:
Atm, the project is light years away from when air in between lens, and the die is a problem.
Before you will run out of raw numeric aperture, things like temperature control, nanometric precision overlay etc, etc, etc will have to be solved first.
Pavel Nikulin Software Engineer +7 702 851 0788 pavel@noa-labs.com
On Fri, Apr 16, 2021 at 1:05 AM David Lanzendörfer
<leviathan@libresilicon.com> wrote:
Hi So turns out there's another way to achieve higher resolutions (below 100nm), without having to use EUV light and low pressure. You can give your exposure unit a nice bath :-) https://en.wikipedia.org/wiki/Immersion_lithography
What do you folks think? Worth considering putting on our TODO list for future stepper iterations?
Cheers -lev
_______________________________________________ Libresilicon-developers mailing list Libresilicon-developers@list.libresilicon.com https://list.libresilicon.com/mailman/listinfo/libresilicon-developers
Nevertheless we should keep in mind this possibility :-) On 4/16/21 1:51 PM, Pavel Nikulin wrote:
Atm, the project is light years away from when air in between lens, and the die is a problem.
Before you will run out of raw numeric aperture, things like temperature control, nanometric precision overlay etc, etc, etc will have to be solved first.
Pavel Nikulin Software Engineer +7 702 851 0788 pavel@noa-labs.com
On Fri, Apr 16, 2021 at 1:05 AM David Lanzendörfer <leviathan@libresilicon.com> wrote:
Hi So turns out there's another way to achieve higher resolutions (below 100nm), without having to use EUV light and low pressure. You can give your exposure unit a nice bath :-) https://en.wikipedia.org/wiki/Immersion_lithography
What do you folks think? Worth considering putting on our TODO list for future stepper iterations?
Cheers -lev
_______________________________________________ Libresilicon-developers mailing list Libresilicon-developers@list.libresilicon.com https://list.libresilicon.com/mailman/listinfo/libresilicon-developers
_______________________________________________ Libresilicon-developers mailing list Libresilicon-developers@list.libresilicon.com https://list.libresilicon.com/mailman/listinfo/libresilicon-developers
participants (3)
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David Lanzendörfer -
Hagen SANKOWSKI -
Pavel Nikulin