[Libre-silicon-devel] Pad cells on test wafer
david.lanzendoerfer at o2s.ch
Sat Jul 21 20:54:39 CEST 2018
> Well, I like to deal with up to three metal layers, not more.
> I would guess, that two metal layers are comfortable and reasonable.
> Regarding the metal processing I would give metal3 also a chance on
> Pearl River.
> My assumption is, that the 5um CMP accuracy will bite us in the ass with
> metal3 already.
For now, because we use Aluminum interconnect, we don't have to use CMP.
And the CMP at RCL Semi in Tai Po will have not only copper interconnect
capabilities but a CMP machine better equipped to adequately planarize the
> So let's try with 3 metal layers for PearlRiver. If we only get 2 layers
> functional, we are still fine - standard cell design mostly still
I expect no problems with the 3 metal layers, because the Aluminum can easily
be etched with the Aluminum etcher.
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