[Libre-silicon-devel] Using 3D Printers to create our own photomasks
ludwig.jaffe at gmail.com
Sun Feb 10 10:42:26 CET 2019
I think we should work on the process using an existing fab with existing
machines, as it is
hard work to do.
So let alone the optics (dispersion, wavelength) of a photo lithography
machine. If you get to structure widths that are
in the range of the wavelength of the light being used things become
difficult as there are
interference patterns which are formed with the mask and the light which
forces the user
to generate special masks that compensate the effects of interference like
it is used in holographic technology.
Or go for a shorter wave length and use UV lasers for the lithography which
are now available.
In times where the 1000nm processes were made UV lasers were not commonly
available to my knowledge,
but just using another laser with an old machine might be a problem because
the optics were made for a different
wave length but maybe, this can be adjusted by changing the distance of the
optics to the waver and/or mask thus
forcing major changes to the machine.
It is not that easy, one thing after the other.
On Sun, Feb 10, 2019 at 3:55 AM David Lanzendörfer <
david.lanzendoerfer at o2s.ch> wrote:
> > Thanks a lot for the reply. I’ll check out the link ASAP. Are there any
> > ongoing known research about this approach? Is it cost efficient for test
> > wafers?
> We're not at this point yet, so I couldn't tell.
> Libre-silicon-devel mailing list
> Libre-silicon-devel at list.libresilicon.com
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