[Libre-silicon-devel] Using 3D Printers to create our own photomasks

Mohammad Amin Nili manili.devteam at gmail.com
Sun Feb 10 12:55:16 CET 2019

David, Ludwig

Thanks a lot for the replies, the answers were so useful.
However I am so sorry for misleading the main topic of the mailing list.

Best regards,

> On Feb 10, 2019, at 1:12 PM, ludwig jaffe <ludwig.jaffe at gmail.com> wrote:
> I think we should work on the process using an existing fab with existing machines, as it is
> hard work to do.
> So let alone the optics (dispersion, wavelength) of a photo lithography machine. If you get to structure widths that are
> in the range of the wavelength of the light being used things become difficult as there are 
> interference patterns which are formed with the mask and the light which forces the user
> to generate special masks that compensate the effects of interference like it is used in holographic technology.
> Or go for a shorter wave length and use UV lasers for the lithography which are now available.
> In times where the 1000nm processes were made UV lasers were not commonly available to my knowledge,
> but just using another laser with an old machine might be a problem because the optics were made for a different
> wave length but maybe, this can be adjusted by changing the distance of the optics to the waver and/or mask thus
> forcing major changes to the machine.
> It is not that easy, one thing after the other.
> Cheers,
> Ludwig
> On Sun, Feb 10, 2019 at 3:55 AM David Lanzendörfer <david.lanzendoerfer at o2s.ch <mailto:david.lanzendoerfer at o2s.ch>> wrote:
> Hi
> > Thanks a lot for the reply. I’ll check out the link ASAP. Are there any
> > ongoing known research about this approach? Is it cost efficient for test
> > wafers?
> We're not at this point yet, so I couldn't tell.
> Cheers
>     David
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