[Libre-silicon-devel] Status update, nickel etching
david.lanzendoerfer at o2s.ch
Tue May 21 13:41:35 CEST 2019
So, because the MFC for the Cl2 has been erratic and the MFC replacement is
very time consuming and a new MFC is pretty expensive, we just decided to
manually turn off the Cl2 valve and run it with Argon only.
Turns out, that ion bombardment was even too slow, when using a pure Argon
plasma for etching.
I've spent the entire day working with the Cirie200 today and at the end I
asked for giving it More Power! *Tim Taylor grunt*
With 500W instead of 400W I actually had a usable reaction rate and the nickel
film became so thin, that the underlying oxide became visible.
Tomorrow I prepare 3 more samples and test the etching with the new recipe.
I keep you informed
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