[Libre-silicon-devel] Maskless lithography

Christoph Maier christoph.maier at ieee.org
Fri Apr 10 21:07:11 CEST 2020

On Fri, Apr 10, 2020 at 8:37 PM David Lanzendörfer
<leviathan at libresilicon.com> wrote:
> Hi everyone
> So last Sunday, Ferenc and I brainstormed on how to achieve smaller feature
> sizes with a UV wave length, which limits us to 400nm or so.
> We discussed splitting a lower feature size layout into multiple masks
> and then doing overlapping exposure steps.
> Ferenc pointed out, that we might run into an offset issue.
> I've been thinking about this for a while and the solution came to me on the
> toilet just now, and it's actually surprisingly simple.
> Since we're using a DMD and not physical masks, we can do the multiple
> exposure steps all at once, without any stepping in between.
> while(!eow()) { // end of wafer
> expose_mask(1);
> expose_mask(2);
> step_to_next();
> }


> cheers
> -lev_______________________________________________
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