[Libre-silicon-devel] Maskless lithography
leviathan at libresilicon.com
Sat Apr 11 12:10:33 CEST 2020
Of course it would also work with physical mask.
The goal here is to eliminate the additional step of physical mask making.
Removing the need to physically manufacture masks and then physically
switching masks within the stepper aligner would save time and money.
This said. The discussion right now is about on how to make the most
of this new way of exposing.
Of course, you can do virtually everything with a DMD chip, you could also
do, if you had physical masks in there.
The only advantage is a simplification of the manufacturing process
and a cost reducting, due to the elimination of the mask making step.
On Friday, April 10, 2020 8:51:27 PM WEST Staf Verhaegen wrote:
> This is not going to work. What you basically will be doing is adding two
> sinusoidal intensity profiles with half the period shifted on top of each
> other giving almost not modulation of the intensity anymore. There is not
> reason why this would only be possible with DMD and not with two physical
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