[Libre-silicon-devel] Maskless lithography

Staf Verhaegen staf at fibraservi.eu
Sat Apr 11 13:29:08 CEST 2020

David Lanzendörfer schreef op za 11-04-2020 om 11:10 [+0100]:
> Hi Staf
> Of course it would also work with physical mask.

What I do want to say is that it will neither work for DMD as for
physical masks. You can't increase resolution by doing two prints in a
resist over the resolution you can get with a single print in that same
There have been tries to make the resist non-linear by doing a bake
step in between the two exposures but this causes asymmetry in
sensitivity to the image between the two exposures and has not made it
in production AFAIK. AFAIK, only techniques where the first print is
developed in resist and then transferred through etch in a mask layer
and then doing a second exposure in a fresh resist layer has made it in


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