[Libre-silicon-devel] Maskless lithography

David Lanzendörfer leviathan at libresilicon.com
Sat Apr 11 16:57:50 CEST 2020

Hi Staf
Now I'm getting what you're trying to tell me!
Good point!

However. Double patterning is possible in this way:

This already gives us the possibility to squeeze a bit more resolution out
of the stepper. Right?


On Saturday, April 11, 2020 12:29:08 PM WEST Staf Verhaegen wrote:
> What I do want to say is that it will neither work for DMD as for physical
> masks. You can't increase resolution by doing two prints in a resist over
> the resolution you can get with a single print in that same resist. There
> have been tries to make the resist non-linear by doing a bake step in
> between the two exposures but this causes asymmetry in sensitivity to the
> image between the two exposures and has not made it in production AFAIK.
> AFAIK, only techniques where the first print is developed in resist and
> then transferred through etch in a mask layer and then doing a second
> exposure in a fresh resist layer has made it in production.

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