[Libre-silicon-devel] Maskless lithography

Pavel Nikulin pavel at noa-labs.com
Sun Feb 23 18:18:52 CET 2020

Few ideas from me,

If you are going to stick with 360nm light for now, regular fused silica
should not absorbing it that much. DUV litho needs 200w+ light sources
because their optics is way more massive and more complex.

Have you thought of making something like a microled matrix? Getting 50w
from it onto the wafer with liquid cooling, and simple optics should be

On Sun, Feb 23, 2020 at 8:06 PM Staf Verhaegen <staf at fibraservi.eu> wrote:

> David Lanzendörfer schreef op ma 24-02-2020 om 00:42 [+0800]:
> Hi
> I'm apparently not the first one with the idea to use a DMD chip and an UV
> light source for exposure:
> <https://www.researchgate.net/figure/Layout-for-UV-based-DMD-system-If-the-illumination-is-in-the-UV-spectrum-then-it-must_fig4_50395785>
>  <https://www.researchgate.net/figure/Layout-for-UV-based-DMD-system-If-the-illumination-is-in-the-UV-spectrum-then-it-must_fig4_50395785>https://www.researchgate.net/figure/Layout-for-UV-based-DMD-system-If-the-illumination-is-in-the-UV-spectrum-then-it-must_fig4_50395785
> Also Sam Zeloof has made his own chip with a DLP projector:
> http://sam.zeloof.xyz/maskless-photolithography/
> greets,
> Staf.
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