From eegerferenc at gmail.com  Sun Mar  8 14:15:34 2020
From: eegerferenc at gmail.com (=?UTF-8?B?w4lnZXIgRmVyZW5j?=)
Date: Sun, 8 Mar 2020 14:15:34 +0100
Subject: [Libre-silicon-devel] Weekly Mumble
Message-ID: <CABMxOxjmmuAM8D5xL+nFquzgTEwuqD94fc=MU6d2su3q4WEC+g@mail.gmail.com>

Hello Everyone!

Is the scheduling of weekly Mumble session still Sunday 2100 HKT? I found
no-one there and then.

Regards,
Ferenc
-------------- next part --------------
An HTML attachment was scrubbed...
URL: <http://list.libresilicon.com/pipermail/libresilicon-developers/attachments/20200308/1e528933/attachment.html>

From leviathan at libresilicon.com  Sun Mar  8 14:22:45 2020
From: leviathan at libresilicon.com (David =?ISO-8859-1?Q?Lanzend=F6rfer?=)
Date: Sun, 08 Mar 2020 13:22:45 +0000
Subject: [Libre-silicon-devel] Weekly Mumble
In-Reply-To: <CABMxOxjmmuAM8D5xL+nFquzgTEwuqD94fc=MU6d2su3q4WEC+g@mail.gmail.com>
References: <CABMxOxjmmuAM8D5xL+nFquzgTEwuqD94fc=MU6d2su3q4WEC+g@mail.gmail.com>
Message-ID: <3053650.8N48SxpH9P@lenny>

Hi
I just had forgotten, that with the new time zone, the meeting would have 
started 20 minutes ago ^^'
I quickly install the mumble client on this laptop here and come online.

cheers
-lev

Am Sunday, March 8, 2020, 1:15:34 PM WET schrieb ?ger Ferenc:
> Hello Everyone!
> 
> Is the scheduling of weekly Mumble session still Sunday 2100 HKT? I found
> no-one there and then.
> 
> Regards,
> Ferenc

-------------- next part --------------
A non-text attachment was scrubbed...
Name: signature.asc
Type: application/pgp-signature
Size: 195 bytes
Desc: This is a digitally signed message part.
URL: <http://list.libresilicon.com/pipermail/libresilicon-developers/attachments/20200308/4a2042ff/attachment.sig>

From leviathan at libresilicon.com  Sun Mar  8 14:30:45 2020
From: leviathan at libresilicon.com (David =?ISO-8859-1?Q?Lanzend=F6rfer?=)
Date: Sun, 08 Mar 2020 13:30:45 +0000
Subject: [Libre-silicon-devel] Weekly Mumble
In-Reply-To: <3053650.8N48SxpH9P@lenny>
References: <CABMxOxjmmuAM8D5xL+nFquzgTEwuqD94fc=MU6d2su3q4WEC+g@mail.gmail.com>
 <3053650.8N48SxpH9P@lenny>
Message-ID: <3169604.DrkGN0qVNa@lenny>

I'm now in Mumble

Am Sunday, March 8, 2020, 1:22:45 PM WET schrieb David Lanzend?rfer:
> Hi
> I just had forgotten, that with the new time zone, the meeting would have
> started 20 minutes ago ^^'
> I quickly install the mumble client on this laptop here and come online.
> 
> cheers
> -lev
> 
> Am Sunday, March 8, 2020, 1:15:34 PM WET schrieb ?ger Ferenc:
> > Hello Everyone!
> > 
> > Is the scheduling of weekly Mumble session still Sunday 2100 HKT? I found
> > no-one there and then.
> > 
> > Regards,
> > Ferenc

-------------- next part --------------
A non-text attachment was scrubbed...
Name: signature.asc
Type: application/pgp-signature
Size: 195 bytes
Desc: This is a digitally signed message part.
URL: <http://list.libresilicon.com/pipermail/libresilicon-developers/attachments/20200308/69924529/attachment.sig>

From pavel at noa-labs.com  Wed Mar 11 00:45:09 2020
From: pavel at noa-labs.com (Pavel Nikulin)
Date: Wed, 11 Mar 2020 05:45:09 +0600
Subject: [Libre-silicon-devel] Maskless lithography
In-Reply-To: <6514823.FIfEt4xGWz@dizzy-7>
References: <14520497.D7jU0x56Jg@dizzy-7> <10841269.atouL5KuaO@dizzy-7>
 <CAG-pW8Ee8JnbVmFPm0AowOrDKR0mnpv8DASoq8ge0+9+bbbzyA@mail.gmail.com>
 <6514823.FIfEt4xGWz@dizzy-7>
Message-ID: <CAG-pW8F1NJeD_SQTCkG4zgatvXv7_wQohVciofRkGGvsrb+eWw@mail.gmail.com>

Following on the custom microled device idea. One company I have heard
of recently is Hong Kong Beida Jade Bird Display. They still don't
have a selling product, and the last time I saw them on an industry
event, they were still pitching people around
https://www.jb-display.com/projects

Maybe they will be open to the idea of a custom device. 435nm is
achievable with GaN with which they already work. 435nm is not great,
but still better than i-line

On Mon, Feb 24, 2020 at 12:43 PM David Lanzend?rfer
<leviathan at libresilicon.com> wrote:
>
> Hi
> So as Staf pointed out, EUV exposure has to be performed at a very very low
> pressure, which is inconvenient to handle.
> So I'd prefer DUV or normal UV light.
> However, it would be of course fantastic, if we could reach feature sizes of
> 50nm or so.
> It occured to me, that we will have an e-beam exposure unit available anyway,
> at the lab, and that we can deposit all of the materials I've come across
> so far, commonly used to build UV LEDs.
> Do we wanna design our own (D)UV microLED matrix, maybe?
> We have the manufacturing equipment anyway, and it might be a cool
> selling point. And it's probably easier to manufacture than MEMs.
>
> As kind of a side quest :-)
>
> -lev
>
> > You can't produce EUV with anything made of solid matter. Even DUV and
> > Fluorine lasers (157nm) get absorbed way too enthusiastically. This is
> > why Fluorine litho sank on arrival, and the industry stayed on 193nm.
> > Switching to 157nm was requiring a change of material technology
> > comparable to EUV, but long term gains were not in 157nm's favour.
> >
> > Both 157nm and EUV can make 25nm feature sizes, but that's only a
> > small increment over 30-35 nm what a typical DUV system can do with
> > immersion. The industry still went EUV because tech transition with it
> > would ease future transition to Xray litho, which would also rely on
> > similar resist chemistry and vacuum.

From leviathan at libresilicon.com  Wed Mar 11 10:15:17 2020
From: leviathan at libresilicon.com (David =?ISO-8859-1?Q?Lanzend=F6rfer?=)
Date: Wed, 11 Mar 2020 09:15:17 +0000
Subject: [Libre-silicon-devel] Maskless lithography
In-Reply-To: <CAG-pW8F1NJeD_SQTCkG4zgatvXv7_wQohVciofRkGGvsrb+eWw@mail.gmail.com>
References: <14520497.D7jU0x56Jg@dizzy-7> <6514823.FIfEt4xGWz@dizzy-7>
 <CAG-pW8F1NJeD_SQTCkG4zgatvXv7_wQohVciofRkGGvsrb+eWw@mail.gmail.com>
Message-ID: <3506413.DHXFvH0MNj@lenny>

Hi Pavel
Do you have a contact or so, of those guys?
I've just moved to Portugal and enjoy this beautiful place with its very very
nice view everywhere :-)
(I'd go into the details now about all those beautiful ladies, but this
mailing list is public xD)
Maybe you can get us into touch by sending an email to both of us,
in case you got a mingpian from the folks or so?
But considering, that they haven't managed to manufacture a working
prototype, they might not be able to produce anything better, then
what we could manufacture at INL (The new lab in Portugal) anyway.
We maybe have to hack something together with a less expensive
DMD display operated outside the specified ranges...
There are some micro mirror devices which materials which can also
reflect UV light, I believe.
In addition, it would solve the issue with addressing and homogenity
of the UV light source.

Cheers
-lev

Am Tuesday, March 10, 2020, 11:45:09 PM WET schrieb Pavel Nikulin:
> Following on the custom microled device idea. One company I have heard
> of recently is Hong Kong Beida Jade Bird Display. They still don't
> have a selling product, and the last time I saw them on an industry
> event, they were still pitching people around
> https://www.jb-display.com/projects
> 
> Maybe they will be open to the idea of a custom device. 435nm is
> achievable with GaN with which they already work. 435nm is not great,
> but still better than i-line
> 
> On Mon, Feb 24, 2020 at 12:43 PM David Lanzend?rfer
> 
> <leviathan at libresilicon.com> wrote:
> > Hi
> > So as Staf pointed out, EUV exposure has to be performed at a very very
> > low
> > pressure, which is inconvenient to handle.
> > So I'd prefer DUV or normal UV light.
> > However, it would be of course fantastic, if we could reach feature sizes
> > of 50nm or so.
> > It occured to me, that we will have an e-beam exposure unit available
> > anyway, at the lab, and that we can deposit all of the materials I've
> > come across so far, commonly used to build UV LEDs.
> > Do we wanna design our own (D)UV microLED matrix, maybe?
> > We have the manufacturing equipment anyway, and it might be a cool
> > selling point. And it's probably easier to manufacture than MEMs.
> > 
> > As kind of a side quest :-)
> > 
> > -lev
> > 
> > > You can't produce EUV with anything made of solid matter. Even DUV and
> > > Fluorine lasers (157nm) get absorbed way too enthusiastically. This is
> > > why Fluorine litho sank on arrival, and the industry stayed on 193nm.
> > > Switching to 157nm was requiring a change of material technology
> > > comparable to EUV, but long term gains were not in 157nm's favour.
> > > 
> > > Both 157nm and EUV can make 25nm feature sizes, but that's only a
> > > small increment over 30-35 nm what a typical DUV system can do with
> > > immersion. The industry still went EUV because tech transition with it
> > > would ease future transition to Xray litho, which would also rely on
> > > similar resist chemistry and vacuum.
> 
> _______________________________________________
> Libresilicon-developers mailing list
> Libresilicon-developers at list.libresilicon.com
> https://list.libresilicon.com/mailman/listinfo/libresilicon-developers

-------------- next part --------------
A non-text attachment was scrubbed...
Name: signature.asc
Type: application/pgp-signature
Size: 195 bytes
Desc: This is a digitally signed message part.
URL: <http://list.libresilicon.com/pipermail/libresilicon-developers/attachments/20200311/17d30c72/attachment.sig>

From pavel at noa-labs.com  Wed Mar 11 12:22:44 2020
From: pavel at noa-labs.com (Pavel Nikulin)
Date: Wed, 11 Mar 2020 17:22:44 +0600
Subject: [Libre-silicon-devel] Maskless lithography
In-Reply-To: <3506413.DHXFvH0MNj@lenny>
References: <14520497.D7jU0x56Jg@dizzy-7> <6514823.FIfEt4xGWz@dizzy-7>
 <CAG-pW8F1NJeD_SQTCkG4zgatvXv7_wQohVciofRkGGvsrb+eWw@mail.gmail.com>
 <3506413.DHXFvH0MNj@lenny>
Message-ID: <CAG-pW8HRV8mM5xvFrDJ8yGM3dBnp=kqKDh_QFMtq9uGpQvK_9w@mail.gmail.com>

No contact with them. When I meant that they haven't sold anything, I
meant them not having a customer. I saw them showing working samples.

Making LEDs for short wavelengths is very far from trivial, even in
the case of the most plain types. I supposed custom DMDs are even
harder.

On Wed, Mar 11, 2020 at 3:15 PM David Lanzend?rfer
<leviathan at libresilicon.com> wrote:
>
> Hi Pavel
> Do you have a contact or so, of those guys?
> I've just moved to Portugal and enjoy this beautiful place with its very very
> nice view everywhere :-)
> (I'd go into the details now about all those beautiful ladies, but this
> mailing list is public xD)
> Maybe you can get us into touch by sending an email to both of us,
> in case you got a mingpian from the folks or so?
> But considering, that they haven't managed to manufacture a working
> prototype, they might not be able to produce anything better, then
> what we could manufacture at INL (The new lab in Portugal) anyway.
> We maybe have to hack something together with a less expensive
> DMD display operated outside the specified ranges...
> There are some micro mirror devices which materials which can also
> reflect UV light, I believe.
> In addition, it would solve the issue with addressing and homogenity
> of the UV light source.
>
> Cheers
> -lev
>
> Am Tuesday, March 10, 2020, 11:45:09 PM WET schrieb Pavel Nikulin:
> > Following on the custom microled device idea. One company I have heard
> > of recently is Hong Kong Beida Jade Bird Display. They still don't
> > have a selling product, and the last time I saw them on an industry
> > event, they were still pitching people around
> > https://www.jb-display.com/projects
> >
> > Maybe they will be open to the idea of a custom device. 435nm is
> > achievable with GaN with which they already work. 435nm is not great,
> > but still better than i-line
> >
> > On Mon, Feb 24, 2020 at 12:43 PM David Lanzend?rfer
> >
> > <leviathan at libresilicon.com> wrote:
> > > Hi
> > > So as Staf pointed out, EUV exposure has to be performed at a very very
> > > low
> > > pressure, which is inconvenient to handle.
> > > So I'd prefer DUV or normal UV light.
> > > However, it would be of course fantastic, if we could reach feature sizes
> > > of 50nm or so.
> > > It occured to me, that we will have an e-beam exposure unit available
> > > anyway, at the lab, and that we can deposit all of the materials I've
> > > come across so far, commonly used to build UV LEDs.
> > > Do we wanna design our own (D)UV microLED matrix, maybe?
> > > We have the manufacturing equipment anyway, and it might be a cool
> > > selling point. And it's probably easier to manufacture than MEMs.
> > >
> > > As kind of a side quest :-)
> > >
> > > -lev
> > >
> > > > You can't produce EUV with anything made of solid matter. Even DUV and
> > > > Fluorine lasers (157nm) get absorbed way too enthusiastically. This is
> > > > why Fluorine litho sank on arrival, and the industry stayed on 193nm.
> > > > Switching to 157nm was requiring a change of material technology
> > > > comparable to EUV, but long term gains were not in 157nm's favour.
> > > >
> > > > Both 157nm and EUV can make 25nm feature sizes, but that's only a
> > > > small increment over 30-35 nm what a typical DUV system can do with
> > > > immersion. The industry still went EUV because tech transition with it
> > > > would ease future transition to Xray litho, which would also rely on
> > > > similar resist chemistry and vacuum.
> >
> > _______________________________________________
> > Libresilicon-developers mailing list
> > Libresilicon-developers at list.libresilicon.com
> > https://list.libresilicon.com/mailman/listinfo/libresilicon-developers
>

From pavel at noa-labs.com  Wed Mar 11 12:30:17 2020
From: pavel at noa-labs.com (Pavel Nikulin)
Date: Wed, 11 Mar 2020 17:30:17 +0600
Subject: [Libre-silicon-devel] Maskless lithography
In-Reply-To: <3506413.DHXFvH0MNj@lenny>
References: <14520497.D7jU0x56Jg@dizzy-7> <6514823.FIfEt4xGWz@dizzy-7>
 <CAG-pW8F1NJeD_SQTCkG4zgatvXv7_wQohVciofRkGGvsrb+eWw@mail.gmail.com>
 <3506413.DHXFvH0MNj@lenny>
Message-ID: <CAG-pW8HmkkQxDN8Lf4fa6v85iKpuw-+M3Z5m6f6_hMSiT+HEug@mail.gmail.com>

The benefit of DMD is that it's probably physically possible to make
one for short enough wavelength, and then use whatever plasma light
source with it. On the other hand, DMD will probably need a
dramatically different optics that will necessitate somebody PhD level
to work on it. Even in the years of i-line devices, optics was already
gigantic enough, and likely made a big part of the scanner cost.

On Wed, Mar 11, 2020 at 3:15 PM David Lanzend?rfer
<leviathan at libresilicon.com> wrote:
>
> Hi Pavel
> Do you have a contact or so, of those guys?
> I've just moved to Portugal and enjoy this beautiful place with its very very
> nice view everywhere :-)
> (I'd go into the details now about all those beautiful ladies, but this
> mailing list is public xD)
> Maybe you can get us into touch by sending an email to both of us,
> in case you got a mingpian from the folks or so?
> But considering, that they haven't managed to manufacture a working
> prototype, they might not be able to produce anything better, then
> what we could manufacture at INL (The new lab in Portugal) anyway.
> We maybe have to hack something together with a less expensive
> DMD display operated outside the specified ranges...
> There are some micro mirror devices which materials which can also
> reflect UV light, I believe.
> In addition, it would solve the issue with addressing and homogenity
> of the UV light source.
>
> Cheers
> -lev
>
> Am Tuesday, March 10, 2020, 11:45:09 PM WET schrieb Pavel Nikulin:
> > Following on the custom microled device idea. One company I have heard
> > of recently is Hong Kong Beida Jade Bird Display. They still don't
> > have a selling product, and the last time I saw them on an industry
> > event, they were still pitching people around
> > https://www.jb-display.com/projects
> >
> > Maybe they will be open to the idea of a custom device. 435nm is
> > achievable with GaN with which they already work. 435nm is not great,
> > but still better than i-line
> >
> > On Mon, Feb 24, 2020 at 12:43 PM David Lanzend?rfer
> >
> > <leviathan at libresilicon.com> wrote:
> > > Hi
> > > So as Staf pointed out, EUV exposure has to be performed at a very very
> > > low
> > > pressure, which is inconvenient to handle.
> > > So I'd prefer DUV or normal UV light.
> > > However, it would be of course fantastic, if we could reach feature sizes
> > > of 50nm or so.
> > > It occured to me, that we will have an e-beam exposure unit available
> > > anyway, at the lab, and that we can deposit all of the materials I've
> > > come across so far, commonly used to build UV LEDs.
> > > Do we wanna design our own (D)UV microLED matrix, maybe?
> > > We have the manufacturing equipment anyway, and it might be a cool
> > > selling point. And it's probably easier to manufacture than MEMs.
> > >
> > > As kind of a side quest :-)
> > >
> > > -lev
> > >
> > > > You can't produce EUV with anything made of solid matter. Even DUV and
> > > > Fluorine lasers (157nm) get absorbed way too enthusiastically. This is
> > > > why Fluorine litho sank on arrival, and the industry stayed on 193nm.
> > > > Switching to 157nm was requiring a change of material technology
> > > > comparable to EUV, but long term gains were not in 157nm's favour.
> > > >
> > > > Both 157nm and EUV can make 25nm feature sizes, but that's only a
> > > > small increment over 30-35 nm what a typical DUV system can do with
> > > > immersion. The industry still went EUV because tech transition with it
> > > > would ease future transition to Xray litho, which would also rely on
> > > > similar resist chemistry and vacuum.
> >
> > _______________________________________________
> > Libresilicon-developers mailing list
> > Libresilicon-developers at list.libresilicon.com
> > https://list.libresilicon.com/mailman/listinfo/libresilicon-developers
>

From pavel at noa-labs.com  Wed Mar 11 13:20:02 2020
From: pavel at noa-labs.com (Pavel Nikulin)
Date: Wed, 11 Mar 2020 18:20:02 +0600
Subject: [Libre-silicon-devel] Maskless lithography
In-Reply-To: <3506413.DHXFvH0MNj@lenny>
References: <14520497.D7jU0x56Jg@dizzy-7> <6514823.FIfEt4xGWz@dizzy-7>
 <CAG-pW8F1NJeD_SQTCkG4zgatvXv7_wQohVciofRkGGvsrb+eWw@mail.gmail.com>
 <3506413.DHXFvH0MNj@lenny>
Message-ID: <CAG-pW8E=--cqUR_1piYofACJ2G4ng5TJZCtgubzxzZKKOMpAVw@mail.gmail.com>

Former CTO email: fang_ou at jb-display.com

I head Apple has hired him

On Wed, Mar 11, 2020 at 3:15 PM David Lanzend?rfer
<leviathan at libresilicon.com> wrote:
>
> Hi Pavel
> Do you have a contact or so, of those guys?
> I've just moved to Portugal and enjoy this beautiful place with its very very
> nice view everywhere :-)
> (I'd go into the details now about all those beautiful ladies, but this
> mailing list is public xD)
> Maybe you can get us into touch by sending an email to both of us,
> in case you got a mingpian from the folks or so?
> But considering, that they haven't managed to manufacture a working
> prototype, they might not be able to produce anything better, then
> what we could manufacture at INL (The new lab in Portugal) anyway.
> We maybe have to hack something together with a less expensive
> DMD display operated outside the specified ranges...
> There are some micro mirror devices which materials which can also
> reflect UV light, I believe.
> In addition, it would solve the issue with addressing and homogenity
> of the UV light source.
>
> Cheers
> -lev
>
> Am Tuesday, March 10, 2020, 11:45:09 PM WET schrieb Pavel Nikulin:
> > Following on the custom microled device idea. One company I have heard
> > of recently is Hong Kong Beida Jade Bird Display. They still don't
> > have a selling product, and the last time I saw them on an industry
> > event, they were still pitching people around
> > https://www.jb-display.com/projects
> >
> > Maybe they will be open to the idea of a custom device. 435nm is
> > achievable with GaN with which they already work. 435nm is not great,
> > but still better than i-line
> >
> > On Mon, Feb 24, 2020 at 12:43 PM David Lanzend?rfer
> >
> > <leviathan at libresilicon.com> wrote:
> > > Hi
> > > So as Staf pointed out, EUV exposure has to be performed at a very very
> > > low
> > > pressure, which is inconvenient to handle.
> > > So I'd prefer DUV or normal UV light.
> > > However, it would be of course fantastic, if we could reach feature sizes
> > > of 50nm or so.
> > > It occured to me, that we will have an e-beam exposure unit available
> > > anyway, at the lab, and that we can deposit all of the materials I've
> > > come across so far, commonly used to build UV LEDs.
> > > Do we wanna design our own (D)UV microLED matrix, maybe?
> > > We have the manufacturing equipment anyway, and it might be a cool
> > > selling point. And it's probably easier to manufacture than MEMs.
> > >
> > > As kind of a side quest :-)
> > >
> > > -lev
> > >
> > > > You can't produce EUV with anything made of solid matter. Even DUV and
> > > > Fluorine lasers (157nm) get absorbed way too enthusiastically. This is
> > > > why Fluorine litho sank on arrival, and the industry stayed on 193nm.
> > > > Switching to 157nm was requiring a change of material technology
> > > > comparable to EUV, but long term gains were not in 157nm's favour.
> > > >
> > > > Both 157nm and EUV can make 25nm feature sizes, but that's only a
> > > > small increment over 30-35 nm what a typical DUV system can do with
> > > > immersion. The industry still went EUV because tech transition with it
> > > > would ease future transition to Xray litho, which would also rely on
> > > > similar resist chemistry and vacuum.
> >
> > _______________________________________________
> > Libresilicon-developers mailing list
> > Libresilicon-developers at list.libresilicon.com
> > https://list.libresilicon.com/mailman/listinfo/libresilicon-developers
>

From pavel at noa-labs.com  Wed Mar 11 13:53:14 2020
From: pavel at noa-labs.com (Pavel Nikulin)
Date: Wed, 11 Mar 2020 18:53:14 +0600
Subject: [Libre-silicon-devel] Maskless lithography
In-Reply-To: <3506413.DHXFvH0MNj@lenny>
References: <14520497.D7jU0x56Jg@dizzy-7> <6514823.FIfEt4xGWz@dizzy-7>
 <CAG-pW8F1NJeD_SQTCkG4zgatvXv7_wQohVciofRkGGvsrb+eWw@mail.gmail.com>
 <3506413.DHXFvH0MNj@lenny>
Message-ID: <CAG-pW8F=t+gVdQaUdCdMJavD6+wqM7YrF4UekjCGDCV6eBiPrw@mail.gmail.com>

Another fellow worth contacting is this gentleman
https://www.linkedin.com/in/eddie-wing-cheung-chong-30496014 .

I believe that after Apple has hired half of JBD's core team, the
company has effectively turned defunct. It would be funny seeing how
Apple vs. Beida (true owner of Jade Bird group) will fare in Chinese
courts.

On Wed, Mar 11, 2020 at 3:15 PM David Lanzend?rfer
<leviathan at libresilicon.com> wrote:
>
> Hi Pavel
> Do you have a contact or so, of those guys?
> I've just moved to Portugal and enjoy this beautiful place with its very very
> nice view everywhere :-)
> (I'd go into the details now about all those beautiful ladies, but this
> mailing list is public xD)
> Maybe you can get us into touch by sending an email to both of us,
> in case you got a mingpian from the folks or so?
> But considering, that they haven't managed to manufacture a working
> prototype, they might not be able to produce anything better, then
> what we could manufacture at INL (The new lab in Portugal) anyway.
> We maybe have to hack something together with a less expensive
> DMD display operated outside the specified ranges...
> There are some micro mirror devices which materials which can also
> reflect UV light, I believe.
> In addition, it would solve the issue with addressing and homogenity
> of the UV light source.
>
> Cheers
> -lev
>
> Am Tuesday, March 10, 2020, 11:45:09 PM WET schrieb Pavel Nikulin:
> > Following on the custom microled device idea. One company I have heard
> > of recently is Hong Kong Beida Jade Bird Display. They still don't
> > have a selling product, and the last time I saw them on an industry
> > event, they were still pitching people around
> > https://www.jb-display.com/projects
> >
> > Maybe they will be open to the idea of a custom device. 435nm is
> > achievable with GaN with which they already work. 435nm is not great,
> > but still better than i-line
> >
> > On Mon, Feb 24, 2020 at 12:43 PM David Lanzend?rfer
> >
> > <leviathan at libresilicon.com> wrote:
> > > Hi
> > > So as Staf pointed out, EUV exposure has to be performed at a very very
> > > low
> > > pressure, which is inconvenient to handle.
> > > So I'd prefer DUV or normal UV light.
> > > However, it would be of course fantastic, if we could reach feature sizes
> > > of 50nm or so.
> > > It occured to me, that we will have an e-beam exposure unit available
> > > anyway, at the lab, and that we can deposit all of the materials I've
> > > come across so far, commonly used to build UV LEDs.
> > > Do we wanna design our own (D)UV microLED matrix, maybe?
> > > We have the manufacturing equipment anyway, and it might be a cool
> > > selling point. And it's probably easier to manufacture than MEMs.
> > >
> > > As kind of a side quest :-)
> > >
> > > -lev
> > >
> > > > You can't produce EUV with anything made of solid matter. Even DUV and
> > > > Fluorine lasers (157nm) get absorbed way too enthusiastically. This is
> > > > why Fluorine litho sank on arrival, and the industry stayed on 193nm.
> > > > Switching to 157nm was requiring a change of material technology
> > > > comparable to EUV, but long term gains were not in 157nm's favour.
> > > >
> > > > Both 157nm and EUV can make 25nm feature sizes, but that's only a
> > > > small increment over 30-35 nm what a typical DUV system can do with
> > > > immersion. The industry still went EUV because tech transition with it
> > > > would ease future transition to Xray litho, which would also rely on
> > > > similar resist chemistry and vacuum.
> >
> > _______________________________________________
> > Libresilicon-developers mailing list
> > Libresilicon-developers at list.libresilicon.com
> > https://list.libresilicon.com/mailman/listinfo/libresilicon-developers
>

From reminder at libresilicon.com  Sun Mar 22 12:18:21 2020
From: reminder at libresilicon.com (reminder at libresilicon.com)
Date: Sun, 22 Mar 2020 12:18:21 +0100
Subject: [Libre-silicon-devel] Reminder - Next Mumble session on Sunday,
	23/03/2020, 21.00 HKT
Message-ID: <20200322111823.360A033E637@mail.lanceville.cn>

Hello List!
Just a small reminder for our next Mumble Sessions on this Sunday, 23/03/2020, at 21.00 Hong Kong Time.
Please join us as usual at our Mumble Server murmur.libresilicon.com at Port 64738, the Channel is IC.

Thanks for the attention!

From leviathan at libresilicon.com  Sun Mar 22 12:19:23 2020
From: leviathan at libresilicon.com (David =?ISO-8859-1?Q?Lanzend=F6rfer?=)
Date: Sun, 22 Mar 2020 11:19:23 +0000
Subject: [Libre-silicon-devel] Reminder - Next Mumble session on Sunday,
 23/03/2020, 21.00 HKT
In-Reply-To: <20200322111823.360A033E637@mail.lanceville.cn>
References: <20200322111823.360A033E637@mail.lanceville.cn>
Message-ID: <2294526.uaLiDUUDmq@lenny>

Hi
And ooops
For some reason it says 23 instead of 22nd
Of course I mean in a 2 hours LOL

glg
-lev

On Sunday, March 22, 2020 11:18:21 AM WET reminder at libresilicon.com wrote:
> Hello List!
> Just a small reminder for our next Mumble Sessions on this Sunday,
> 23/03/2020, at 21.00 Hong Kong Time. Please join us as usual at our Mumble
> Server murmur.libresilicon.com at Port 64738, the Channel is IC.
> 
> Thanks for the attention!
> _______________________________________________
> Libresilicon-developers mailing list
> Libresilicon-developers at list.libresilicon.com
> https://list.libresilicon.com/mailman/listinfo/libresilicon-developers

-------------- next part --------------
A non-text attachment was scrubbed...
Name: signature.asc
Type: application/pgp-signature
Size: 195 bytes
Desc: This is a digitally signed message part.
URL: <http://list.libresilicon.com/pipermail/libresilicon-developers/attachments/20200322/98b9b0a5/attachment.sig>