Hi Here is the ICO white paper we've discussed in the Mumble conference. Glad for feedback: https://docs.google.com/document/d/1XdLKafFeYxJJ69Lj8CvbAB36MNBcKUnrF3OQehWt...
Cheers David
David Lanzendörfer schreef op zo 08-04-2018 om 22:28 [+0800]:
Hi Here is the ICO white paper we've discussed in the Mumble conference. Glad for feedback: https://docs.google.com/document/d/1XdLKafFeYxJJ69Lj8CvbAB36MNBcKUnrF3OQehWt...
Only had time to quickly browse through the document. I am surprised by the use of e-beam for prototyping. Did you look at the possible throughput you can get in that way ? With normal litho processing throughput is given in wafers per hour; for e-beam it is in hours per wafer. And this for each litho step.
greets, Staf.
Hello Staf.
This Paper is somehow historical - I requested it from David during our weekly mumble session today.
Regards, Hagen.
On 04/08/2018 04:47 PM, Staf Verhaegen wrote:
David Lanzendörfer schreef op zo 08-04-2018 om 22:28 [+0800]:
Hi Here is the ICO white paper we've discussed in the Mumble conference. Glad for feedback: https://docs.google.com/document/d/1XdLKafFeYxJJ69Lj8CvbAB36MNBcKUnrF3OQehWt... <https://docs.google.com/document/d/1XdLKafFeYxJJ69Lj8CvbAB36MNBcKUnrF3OQehWt...
Only had time to quickly browse through the document. I am surprised by the use of e-beam for prototyping. Did you look at the possible throughput you can get in that way ? With normal litho processing throughput is given in wafers per hour; for e-beam it is in hours per wafer. And this for each litho step.
greets, Staf.
Libre-silicon-devel mailing list Libre-silicon-devel@list.libresilicon.com http://list.libresilicon.com/mailman/listinfo/libre-silicon-devel
Hello Staf As Hagen said, this ICO white paper is historical. However, as soon as we go below 500nm feature size we can not use direct lithographic exposure anymore without tinkering around with multiple overlapping mask exposures. At that point we will use eBeam to develop our new technology until we know the structures are working and then we'll figure out how to build it with multiple overlapping masks.
Cheers David
On Monday, 9 April 2018 1:36:17 AM HKT Hagen SANKOWSKI wrote:
Hello Staf.
This Paper is somehow historical - I requested it from David during our weekly mumble session today.
Regards, Hagen.
On 04/08/2018 04:47 PM, Staf Verhaegen wrote:
David Lanzendörfer schreef op zo 08-04-2018 om 22:28 [+0800]:
Hi Here is the ICO white paper we've discussed in the Mumble conference. Glad for feedback: https://docs.google.com/document/d/1XdLKafFeYxJJ69Lj8CvbAB36MNBcKUnrF3OQe hWtyBc/edit?usp=sharing https://docs.google.com/document/d/1XdLKafFeYxJJ69Lj8CvbAB36MNBcKUnrF3O QehWtyBc/edit?usp=sharing
Only had time to quickly browse through the document. I am surprised by the use of e-beam for prototyping. Did you look at the possible throughput you can get in that way ? With normal litho processing throughput is given in wafers per hour; for e-beam it is in hours per wafer. And this for each litho step.
greets, Staf.
Libre-silicon-devel mailing list Libre-silicon-devel@list.libresilicon.com http://list.libresilicon.com/mailman/listinfo/libre-silicon-devel
libresilicon-developers@list.libresilicon.com
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David Lanzendörfer -
Hagen SANKOWSKI -
Staf Verhaegen