Hi I'm apparently not the first one with the idea to use a DMD chip and an UV light source for exposure: https://www.researchgate.net/figure/Layout-for-UV-based-DMD-system-If-the-il... There are actually parts available: http://www.ti.com/product/DLP9500UV http://www.ti.com/product/DLP9000XUV For those chips, the UV wave length would be around 360nm The price on Mouser is 8888 USD, so around 9 thousand USD The chip is exactly made for mask less lithography systems as the one I wanna build, it's even mentioned in the data sheet: http://www.ti.com/lit/ds/symlink/dlp9500uv.pdf By optimizing the aperture of the lens system, this means that one could perfectly fine produce feature sizes down to 150 nm or so, maybe even smaller. I wonder, whether we should make a gofundme campaign for buying the required second hand stepper and this chip... Hmm. Also. Since this chip is super expensive, we will need to *really* make sure, that there's no mistake in the PCB, because we only have one attempt. Cheers -lev
David Lanzendörfer schreef op ma 24-02-2020 om 00:42 [+0800]:
HiI'm apparently not the first one with the idea to use a DMD chip and an UVlight source for exposure:https://www.researchgate.net/figure/Layout-for-UV-based-DMD-system-If-the-il...
Also Sam Zeloof has made his own chip with a DLP projector: http://sam.zeloof.xyz/maskless-photolithography/ greets, Staf.
Few ideas from me, If you are going to stick with 360nm light for now, regular fused silica should not absorbing it that much. DUV litho needs 200w+ light sources because their optics is way more massive and more complex. Have you thought of making something like a microled matrix? Getting 50w from it onto the wafer with liquid cooling, and simple optics should be real. On Sun, Feb 23, 2020 at 8:06 PM Staf Verhaegen <staf@fibraservi.eu> wrote:
David Lanzendörfer schreef op ma 24-02-2020 om 00:42 [+0800]:
Hi
I'm apparently not the first one with the idea to use a DMD chip and an UV
light source for exposure:
Also Sam Zeloof has made his own chip with a DLP projector: http://sam.zeloof.xyz/maskless-photolithography/
greets, Staf.
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Hi I like the idea. Some researchers apparently have already tried it out and it's feasible: https://aip.scitation.org/doi/abs/10.1063/1.1942636?ver=pdfcov&journalCode=a... If a UV microLED matrix is less expensive than a DMD device, I certainly will go for it! Thanks so much for the tip! Do you have any suggestions on components suitable for that task? Cheers -lev On Monday, 24 February 2020 1:18:52 AM HKT Pavel Nikulin wrote:
Few ideas from me,
If you are going to stick with 360nm light for now, regular fused silica should not absorbing it that much. DUV litho needs 200w+ light sources because their optics is way more massive and more complex.
Have you thought of making something like a microled matrix? Getting 50w from it onto the wafer with liquid cooling, and simple optics should be real.
On Sun, Feb 23, 2020 at 8:06 PM Staf Verhaegen <staf@fibraservi.eu> wrote:
David Lanzendörfer schreef op ma 24-02-2020 om 00:42 [+0800]:
Hi
I'm apparently not the first one with the idea to use a DMD chip and an UV
light source for exposure:
<https://www.researchgate.net/figure/Layout-for-UV-based-DMD-system-If-the -illumination-is-in-the-UV-spectrum-then-it-must_fig4_50395785>> <https://www.researchgate.net/figure/Layout-for-UV-based-DMD-system-If-th e-illumination-is-in-the-UV-spectrum-then-it-must_fig4_50395785>https://w ww.researchgate.net/figure/Layout-for-UV-based-DMD-system-If-the-illumina tion-is-in-the-UV-spectrum-then-it-must_fig4_50395785> Also Sam Zeloof has made his own chip with a DLP projector: http://sam.zeloof.xyz/maskless-photolithography/
greets, Staf.
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There are a number of microled startups that are still labs scale. Growing an AlInGaN instead of GaN + MQW might be a challenge, or it might be not. The cost of custom run will from them will be interesting to know. On Sun, Feb 23, 2020 at 8:25 PM David Lanzendörfer <leviathan@libresilicon.com> wrote:
Hi I like the idea. Some researchers apparently have already tried it out and it's feasible: https://aip.scitation.org/doi/abs/10.1063/1.1942636?ver=pdfcov&journalCode=a...
If a UV microLED matrix is less expensive than a DMD device, I certainly will go for it!
Thanks so much for the tip!
Do you have any suggestions on components suitable for that task?
Cheers -lev
On Monday, 24 February 2020 1:18:52 AM HKT Pavel Nikulin wrote:
Few ideas from me,
If you are going to stick with 360nm light for now, regular fused silica should not absorbing it that much. DUV litho needs 200w+ light sources because their optics is way more massive and more complex.
Have you thought of making something like a microled matrix? Getting 50w from it onto the wafer with liquid cooling, and simple optics should be real.
On Sun, Feb 23, 2020 at 8:06 PM Staf Verhaegen <staf@fibraservi.eu> wrote:
David Lanzendörfer schreef op ma 24-02-2020 om 00:42 [+0800]:
Hi
I'm apparently not the first one with the idea to use a DMD chip and an UV
light source for exposure:
<https://www.researchgate.net/figure/Layout-for-UV-based-DMD-system-If-the -illumination-is-in-the-UV-spectrum-then-it-must_fig4_50395785>> <https://www.researchgate.net/figure/Layout-for-UV-based-DMD-system-If-th e-illumination-is-in-the-UV-spectrum-then-it-must_fig4_50395785>https://w ww.researchgate.net/figure/Layout-for-UV-based-DMD-system-If-the-illumina tion-is-in-the-UV-spectrum-then-it-must_fig4_50395785> Also Sam Zeloof has made his own chip with a DLP projector: http://sam.zeloof.xyz/maskless-photolithography/
greets, Staf.
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Hi What would be nice, would be EUV LEDs, so that we can have even better feature sizes. If we already go customized, why not directly EUV? :-) -lev On Monday, 24 February 2020 1:38:11 AM HKT Pavel Nikulin wrote:
There are a number of microled startups that are still labs scale. Growing an AlInGaN instead of GaN + MQW might be a challenge, or it might be not. The cost of custom run will from them will be interesting to know.
On Sun, Feb 23, 2020 at 8:25 PM David Lanzendörfer
<leviathan@libresilicon.com> wrote:
Hi I like the idea. Some researchers apparently have already tried it out and it's feasible: https://aip.scitation.org/doi/abs/10.1063/1.1942636?ver=pdfcov&journalCode =apl
If a UV microLED matrix is less expensive than a DMD device, I certainly will go for it!
Thanks so much for the tip!
Do you have any suggestions on components suitable for that task?
Cheers -lev
On Monday, 24 February 2020 1:18:52 AM HKT Pavel Nikulin wrote:
Few ideas from me,
If you are going to stick with 360nm light for now, regular fused silica should not absorbing it that much. DUV litho needs 200w+ light sources because their optics is way more massive and more complex.
Have you thought of making something like a microled matrix? Getting 50w from it onto the wafer with liquid cooling, and simple optics should be real.
On Sun, Feb 23, 2020 at 8:06 PM Staf Verhaegen <staf@fibraservi.eu> wrote:
David Lanzendörfer schreef op ma 24-02-2020 om 00:42 [+0800]:
Hi
I'm apparently not the first one with the idea to use a DMD chip and an UV
light source for exposure:
<https://www.researchgate.net/figure/Layout-for-UV-based-DMD-system-If -the -illumination-is-in-the-UV-spectrum-then-it-must_fig4_50395785>>
<https://www.researchgate.net/figure/Layout-for-UV-based-DMD-system-I f-th e-illumination-is-in-the-UV-spectrum-then-it-must_fig4_50395785>https ://w ww.researchgate.net/figure/Layout-for-UV-based-DMD-system-If-the-illu mina tion-is-in-the-UV-spectrum-then-it-must_fig4_50395785>
Also Sam Zeloof has made his own chip with a DLP projector: http://sam.zeloof.xyz/maskless-photolithography/
greets, Staf.
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David, You can't produce EUV with anything made of solid matter. Even DUV and Fluorine lasers (157nm) get absorbed way too enthusiastically. This is why Fluorine litho sank on arrival, and the industry stayed on 193nm. Switching to 157nm was requiring a change of material technology comparable to EUV, but long term gains were not in 157nm's favour. Both 157nm and EUV can make 25nm feature sizes, but that's only a small increment over 30-35 nm what a typical DUV system can do with immersion. The industry still went EUV because tech transition with it would ease future transition to Xray litho, which would also rely on similar resist chemistry and vacuum. On Sun, Feb 23, 2020 at 8:39 PM David Lanzendörfer <leviathan@libresilicon.com> wrote:
Hi What would be nice, would be EUV LEDs, so that we can have even better feature sizes. If we already go customized, why not directly EUV? :-)
-lev
On Monday, 24 February 2020 1:38:11 AM HKT Pavel Nikulin wrote:
There are a number of microled startups that are still labs scale. Growing an AlInGaN instead of GaN + MQW might be a challenge, or it might be not. The cost of custom run will from them will be interesting to know.
On Sun, Feb 23, 2020 at 8:25 PM David Lanzendörfer
<leviathan@libresilicon.com> wrote:
Hi I like the idea. Some researchers apparently have already tried it out and it's feasible: https://aip.scitation.org/doi/abs/10.1063/1.1942636?ver=pdfcov&journalCode =apl
If a UV microLED matrix is less expensive than a DMD device, I certainly will go for it!
Thanks so much for the tip!
Do you have any suggestions on components suitable for that task?
Cheers -lev
On Monday, 24 February 2020 1:18:52 AM HKT Pavel Nikulin wrote:
Few ideas from me,
If you are going to stick with 360nm light for now, regular fused silica should not absorbing it that much. DUV litho needs 200w+ light sources because their optics is way more massive and more complex.
Have you thought of making something like a microled matrix? Getting 50w from it onto the wafer with liquid cooling, and simple optics should be real.
On Sun, Feb 23, 2020 at 8:06 PM Staf Verhaegen <staf@fibraservi.eu> wrote:
David Lanzendörfer schreef op ma 24-02-2020 om 00:42 [+0800]:
Hi
I'm apparently not the first one with the idea to use a DMD chip and an UV
light source for exposure:
<https://www.researchgate.net/figure/Layout-for-UV-based-DMD-system-If -the -illumination-is-in-the-UV-spectrum-then-it-must_fig4_50395785>>
<https://www.researchgate.net/figure/Layout-for-UV-based-DMD-system-I f-th e-illumination-is-in-the-UV-spectrum-then-it-must_fig4_50395785>https ://w ww.researchgate.net/figure/Layout-for-UV-based-DMD-system-If-the-illu mina tion-is-in-the-UV-spectrum-then-it-must_fig4_50395785>
Also Sam Zeloof has made his own chip with a DLP projector: http://sam.zeloof.xyz/maskless-photolithography/
greets, Staf.
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Hi So as Staf pointed out, EUV exposure has to be performed at a very very low pressure, which is inconvenient to handle. So I'd prefer DUV or normal UV light. However, it would be of course fantastic, if we could reach feature sizes of 50nm or so. It occured to me, that we will have an e-beam exposure unit available anyway, at the lab, and that we can deposit all of the materials I've come across so far, commonly used to build UV LEDs. Do we wanna design our own (D)UV microLED matrix, maybe? We have the manufacturing equipment anyway, and it might be a cool selling point. And it's probably easier to manufacture than MEMs. As kind of a side quest :-) -lev
You can't produce EUV with anything made of solid matter. Even DUV and Fluorine lasers (157nm) get absorbed way too enthusiastically. This is why Fluorine litho sank on arrival, and the industry stayed on 193nm. Switching to 157nm was requiring a change of material technology comparable to EUV, but long term gains were not in 157nm's favour.
Both 157nm and EUV can make 25nm feature sizes, but that's only a small increment over 30-35 nm what a typical DUV system can do with immersion. The industry still went EUV because tech transition with it would ease future transition to Xray litho, which would also rely on similar resist chemistry and vacuum.
Following on the custom microled device idea. One company I have heard of recently is Hong Kong Beida Jade Bird Display. They still don't have a selling product, and the last time I saw them on an industry event, they were still pitching people around https://www.jb-display.com/projects Maybe they will be open to the idea of a custom device. 435nm is achievable with GaN with which they already work. 435nm is not great, but still better than i-line On Mon, Feb 24, 2020 at 12:43 PM David Lanzendörfer <leviathan@libresilicon.com> wrote:
Hi So as Staf pointed out, EUV exposure has to be performed at a very very low pressure, which is inconvenient to handle. So I'd prefer DUV or normal UV light. However, it would be of course fantastic, if we could reach feature sizes of 50nm or so. It occured to me, that we will have an e-beam exposure unit available anyway, at the lab, and that we can deposit all of the materials I've come across so far, commonly used to build UV LEDs. Do we wanna design our own (D)UV microLED matrix, maybe? We have the manufacturing equipment anyway, and it might be a cool selling point. And it's probably easier to manufacture than MEMs.
As kind of a side quest :-)
-lev
You can't produce EUV with anything made of solid matter. Even DUV and Fluorine lasers (157nm) get absorbed way too enthusiastically. This is why Fluorine litho sank on arrival, and the industry stayed on 193nm. Switching to 157nm was requiring a change of material technology comparable to EUV, but long term gains were not in 157nm's favour.
Both 157nm and EUV can make 25nm feature sizes, but that's only a small increment over 30-35 nm what a typical DUV system can do with immersion. The industry still went EUV because tech transition with it would ease future transition to Xray litho, which would also rely on similar resist chemistry and vacuum.
Hi Pavel Do you have a contact or so, of those guys? I've just moved to Portugal and enjoy this beautiful place with its very very nice view everywhere :-) (I'd go into the details now about all those beautiful ladies, but this mailing list is public xD) Maybe you can get us into touch by sending an email to both of us, in case you got a mingpian from the folks or so? But considering, that they haven't managed to manufacture a working prototype, they might not be able to produce anything better, then what we could manufacture at INL (The new lab in Portugal) anyway. We maybe have to hack something together with a less expensive DMD display operated outside the specified ranges... There are some micro mirror devices which materials which can also reflect UV light, I believe. In addition, it would solve the issue with addressing and homogenity of the UV light source. Cheers -lev Am Tuesday, March 10, 2020, 11:45:09 PM WET schrieb Pavel Nikulin:
Following on the custom microled device idea. One company I have heard of recently is Hong Kong Beida Jade Bird Display. They still don't have a selling product, and the last time I saw them on an industry event, they were still pitching people around https://www.jb-display.com/projects
Maybe they will be open to the idea of a custom device. 435nm is achievable with GaN with which they already work. 435nm is not great, but still better than i-line
On Mon, Feb 24, 2020 at 12:43 PM David Lanzendörfer
<leviathan@libresilicon.com> wrote:
Hi So as Staf pointed out, EUV exposure has to be performed at a very very low pressure, which is inconvenient to handle. So I'd prefer DUV or normal UV light. However, it would be of course fantastic, if we could reach feature sizes of 50nm or so. It occured to me, that we will have an e-beam exposure unit available anyway, at the lab, and that we can deposit all of the materials I've come across so far, commonly used to build UV LEDs. Do we wanna design our own (D)UV microLED matrix, maybe? We have the manufacturing equipment anyway, and it might be a cool selling point. And it's probably easier to manufacture than MEMs.
As kind of a side quest :-)
-lev
You can't produce EUV with anything made of solid matter. Even DUV and Fluorine lasers (157nm) get absorbed way too enthusiastically. This is why Fluorine litho sank on arrival, and the industry stayed on 193nm. Switching to 157nm was requiring a change of material technology comparable to EUV, but long term gains were not in 157nm's favour.
Both 157nm and EUV can make 25nm feature sizes, but that's only a small increment over 30-35 nm what a typical DUV system can do with immersion. The industry still went EUV because tech transition with it would ease future transition to Xray litho, which would also rely on similar resist chemistry and vacuum.
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No contact with them. When I meant that they haven't sold anything, I meant them not having a customer. I saw them showing working samples. Making LEDs for short wavelengths is very far from trivial, even in the case of the most plain types. I supposed custom DMDs are even harder. On Wed, Mar 11, 2020 at 3:15 PM David Lanzendörfer <leviathan@libresilicon.com> wrote:
Hi Pavel Do you have a contact or so, of those guys? I've just moved to Portugal and enjoy this beautiful place with its very very nice view everywhere :-) (I'd go into the details now about all those beautiful ladies, but this mailing list is public xD) Maybe you can get us into touch by sending an email to both of us, in case you got a mingpian from the folks or so? But considering, that they haven't managed to manufacture a working prototype, they might not be able to produce anything better, then what we could manufacture at INL (The new lab in Portugal) anyway. We maybe have to hack something together with a less expensive DMD display operated outside the specified ranges... There are some micro mirror devices which materials which can also reflect UV light, I believe. In addition, it would solve the issue with addressing and homogenity of the UV light source.
Cheers -lev
Am Tuesday, March 10, 2020, 11:45:09 PM WET schrieb Pavel Nikulin:
Following on the custom microled device idea. One company I have heard of recently is Hong Kong Beida Jade Bird Display. They still don't have a selling product, and the last time I saw them on an industry event, they were still pitching people around https://www.jb-display.com/projects
Maybe they will be open to the idea of a custom device. 435nm is achievable with GaN with which they already work. 435nm is not great, but still better than i-line
On Mon, Feb 24, 2020 at 12:43 PM David Lanzendörfer
<leviathan@libresilicon.com> wrote:
Hi So as Staf pointed out, EUV exposure has to be performed at a very very low pressure, which is inconvenient to handle. So I'd prefer DUV or normal UV light. However, it would be of course fantastic, if we could reach feature sizes of 50nm or so. It occured to me, that we will have an e-beam exposure unit available anyway, at the lab, and that we can deposit all of the materials I've come across so far, commonly used to build UV LEDs. Do we wanna design our own (D)UV microLED matrix, maybe? We have the manufacturing equipment anyway, and it might be a cool selling point. And it's probably easier to manufacture than MEMs.
As kind of a side quest :-)
-lev
You can't produce EUV with anything made of solid matter. Even DUV and Fluorine lasers (157nm) get absorbed way too enthusiastically. This is why Fluorine litho sank on arrival, and the industry stayed on 193nm. Switching to 157nm was requiring a change of material technology comparable to EUV, but long term gains were not in 157nm's favour.
Both 157nm and EUV can make 25nm feature sizes, but that's only a small increment over 30-35 nm what a typical DUV system can do with immersion. The industry still went EUV because tech transition with it would ease future transition to Xray litho, which would also rely on similar resist chemistry and vacuum.
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The benefit of DMD is that it's probably physically possible to make one for short enough wavelength, and then use whatever plasma light source with it. On the other hand, DMD will probably need a dramatically different optics that will necessitate somebody PhD level to work on it. Even in the years of i-line devices, optics was already gigantic enough, and likely made a big part of the scanner cost. On Wed, Mar 11, 2020 at 3:15 PM David Lanzendörfer <leviathan@libresilicon.com> wrote:
Hi Pavel Do you have a contact or so, of those guys? I've just moved to Portugal and enjoy this beautiful place with its very very nice view everywhere :-) (I'd go into the details now about all those beautiful ladies, but this mailing list is public xD) Maybe you can get us into touch by sending an email to both of us, in case you got a mingpian from the folks or so? But considering, that they haven't managed to manufacture a working prototype, they might not be able to produce anything better, then what we could manufacture at INL (The new lab in Portugal) anyway. We maybe have to hack something together with a less expensive DMD display operated outside the specified ranges... There are some micro mirror devices which materials which can also reflect UV light, I believe. In addition, it would solve the issue with addressing and homogenity of the UV light source.
Cheers -lev
Am Tuesday, March 10, 2020, 11:45:09 PM WET schrieb Pavel Nikulin:
Following on the custom microled device idea. One company I have heard of recently is Hong Kong Beida Jade Bird Display. They still don't have a selling product, and the last time I saw them on an industry event, they were still pitching people around https://www.jb-display.com/projects
Maybe they will be open to the idea of a custom device. 435nm is achievable with GaN with which they already work. 435nm is not great, but still better than i-line
On Mon, Feb 24, 2020 at 12:43 PM David Lanzendörfer
<leviathan@libresilicon.com> wrote:
Hi So as Staf pointed out, EUV exposure has to be performed at a very very low pressure, which is inconvenient to handle. So I'd prefer DUV or normal UV light. However, it would be of course fantastic, if we could reach feature sizes of 50nm or so. It occured to me, that we will have an e-beam exposure unit available anyway, at the lab, and that we can deposit all of the materials I've come across so far, commonly used to build UV LEDs. Do we wanna design our own (D)UV microLED matrix, maybe? We have the manufacturing equipment anyway, and it might be a cool selling point. And it's probably easier to manufacture than MEMs.
As kind of a side quest :-)
-lev
You can't produce EUV with anything made of solid matter. Even DUV and Fluorine lasers (157nm) get absorbed way too enthusiastically. This is why Fluorine litho sank on arrival, and the industry stayed on 193nm. Switching to 157nm was requiring a change of material technology comparable to EUV, but long term gains were not in 157nm's favour.
Both 157nm and EUV can make 25nm feature sizes, but that's only a small increment over 30-35 nm what a typical DUV system can do with immersion. The industry still went EUV because tech transition with it would ease future transition to Xray litho, which would also rely on similar resist chemistry and vacuum.
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Former CTO email: fang_ou@jb-display.com I head Apple has hired him On Wed, Mar 11, 2020 at 3:15 PM David Lanzendörfer <leviathan@libresilicon.com> wrote:
Hi Pavel Do you have a contact or so, of those guys? I've just moved to Portugal and enjoy this beautiful place with its very very nice view everywhere :-) (I'd go into the details now about all those beautiful ladies, but this mailing list is public xD) Maybe you can get us into touch by sending an email to both of us, in case you got a mingpian from the folks or so? But considering, that they haven't managed to manufacture a working prototype, they might not be able to produce anything better, then what we could manufacture at INL (The new lab in Portugal) anyway. We maybe have to hack something together with a less expensive DMD display operated outside the specified ranges... There are some micro mirror devices which materials which can also reflect UV light, I believe. In addition, it would solve the issue with addressing and homogenity of the UV light source.
Cheers -lev
Am Tuesday, March 10, 2020, 11:45:09 PM WET schrieb Pavel Nikulin:
Following on the custom microled device idea. One company I have heard of recently is Hong Kong Beida Jade Bird Display. They still don't have a selling product, and the last time I saw them on an industry event, they were still pitching people around https://www.jb-display.com/projects
Maybe they will be open to the idea of a custom device. 435nm is achievable with GaN with which they already work. 435nm is not great, but still better than i-line
On Mon, Feb 24, 2020 at 12:43 PM David Lanzendörfer
<leviathan@libresilicon.com> wrote:
Hi So as Staf pointed out, EUV exposure has to be performed at a very very low pressure, which is inconvenient to handle. So I'd prefer DUV or normal UV light. However, it would be of course fantastic, if we could reach feature sizes of 50nm or so. It occured to me, that we will have an e-beam exposure unit available anyway, at the lab, and that we can deposit all of the materials I've come across so far, commonly used to build UV LEDs. Do we wanna design our own (D)UV microLED matrix, maybe? We have the manufacturing equipment anyway, and it might be a cool selling point. And it's probably easier to manufacture than MEMs.
As kind of a side quest :-)
-lev
You can't produce EUV with anything made of solid matter. Even DUV and Fluorine lasers (157nm) get absorbed way too enthusiastically. This is why Fluorine litho sank on arrival, and the industry stayed on 193nm. Switching to 157nm was requiring a change of material technology comparable to EUV, but long term gains were not in 157nm's favour.
Both 157nm and EUV can make 25nm feature sizes, but that's only a small increment over 30-35 nm what a typical DUV system can do with immersion. The industry still went EUV because tech transition with it would ease future transition to Xray litho, which would also rely on similar resist chemistry and vacuum.
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Another fellow worth contacting is this gentleman https://www.linkedin.com/in/eddie-wing-cheung-chong-30496014 . I believe that after Apple has hired half of JBD's core team, the company has effectively turned defunct. It would be funny seeing how Apple vs. Beida (true owner of Jade Bird group) will fare in Chinese courts. On Wed, Mar 11, 2020 at 3:15 PM David Lanzendörfer <leviathan@libresilicon.com> wrote:
Hi Pavel Do you have a contact or so, of those guys? I've just moved to Portugal and enjoy this beautiful place with its very very nice view everywhere :-) (I'd go into the details now about all those beautiful ladies, but this mailing list is public xD) Maybe you can get us into touch by sending an email to both of us, in case you got a mingpian from the folks or so? But considering, that they haven't managed to manufacture a working prototype, they might not be able to produce anything better, then what we could manufacture at INL (The new lab in Portugal) anyway. We maybe have to hack something together with a less expensive DMD display operated outside the specified ranges... There are some micro mirror devices which materials which can also reflect UV light, I believe. In addition, it would solve the issue with addressing and homogenity of the UV light source.
Cheers -lev
Am Tuesday, March 10, 2020, 11:45:09 PM WET schrieb Pavel Nikulin:
Following on the custom microled device idea. One company I have heard of recently is Hong Kong Beida Jade Bird Display. They still don't have a selling product, and the last time I saw them on an industry event, they were still pitching people around https://www.jb-display.com/projects
Maybe they will be open to the idea of a custom device. 435nm is achievable with GaN with which they already work. 435nm is not great, but still better than i-line
On Mon, Feb 24, 2020 at 12:43 PM David Lanzendörfer
<leviathan@libresilicon.com> wrote:
Hi So as Staf pointed out, EUV exposure has to be performed at a very very low pressure, which is inconvenient to handle. So I'd prefer DUV or normal UV light. However, it would be of course fantastic, if we could reach feature sizes of 50nm or so. It occured to me, that we will have an e-beam exposure unit available anyway, at the lab, and that we can deposit all of the materials I've come across so far, commonly used to build UV LEDs. Do we wanna design our own (D)UV microLED matrix, maybe? We have the manufacturing equipment anyway, and it might be a cool selling point. And it's probably easier to manufacture than MEMs.
As kind of a side quest :-)
-lev
You can't produce EUV with anything made of solid matter. Even DUV and Fluorine lasers (157nm) get absorbed way too enthusiastically. This is why Fluorine litho sank on arrival, and the industry stayed on 193nm. Switching to 157nm was requiring a change of material technology comparable to EUV, but long term gains were not in 157nm's favour.
Both 157nm and EUV can make 25nm feature sizes, but that's only a small increment over 30-35 nm what a typical DUV system can do with immersion. The industry still went EUV because tech transition with it would ease future transition to Xray litho, which would also rely on similar resist chemistry and vacuum.
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participants (3)
-
David Lanzendörfer -
Pavel Nikulin -
Staf Verhaegen