Hi Ferenc We decided that it's too risky to include the caps for the alpha release, especially because we're now under pressure to deliver at least something for the congress. So Hagen and I decided that we just go ahead now and at least get the alpha release working. It's pretty cheap to make mask sets at the university where we're prototyping, so we will manufacture another mask set after the congress which will include caps. Priority right now is to get CMOS working.
I hope that's ok.
Cheers David
Hello David, I agree with this. However, I would add that it is possible to "include it and not" in the same time: since the mim is defined by three layers and two masks (metcap and met2), we can have the capacitors in the layout, but we don't stream out the metcap layer, nor perform the extra dielectric and metal deposition steps (efectively realizing two metal plates shorted by vias on the die). Those dies are good for fine-tune the basic steps for MOS and bipolar devices. Later then, we can stream out the metcap mask (leaving all other masks unchanged) and add the two extra layers to the processing. I plan to finish the capacitor layout until Friday latest. What do you think? Regards, Ferenc
On Wed, Nov 14, 2018 at 5:55 PM David Lanzendörfer < david.lanzendoerfer@o2s.ch> wrote:
Hi Ferenc We decided that it's too risky to include the caps for the alpha release, especially because we're now under pressure to deliver at least something for the congress. So Hagen and I decided that we just go ahead now and at least get the alpha release working. It's pretty cheap to make mask sets at the university where we're prototyping, so we will manufacture another mask set after the congress which will include caps. Priority right now is to get CMOS working.
I hope that's ok.
Cheers David
Hi Ferenc Sure. Go ahead and draw some caps, we can then manufacture another mask for PearlRiver beta release and test it. As soon as we've got CMOS working it shouldn't be so difficult anymore to organize sponsors for another mask set round anyway :-)
Cheers David
On Thursday, 15 November 2018 5:49:11 AM HKT Éger Ferenc wrote:
Hello David, I agree with this. However, I would add that it is possible to "include it and not" in the same time: since the mim is defined by three layers and two masks (metcap and met2), we can have the capacitors in the layout, but we don't stream out the metcap layer, nor perform the extra dielectric and metal deposition steps (efectively realizing two metal plates shorted by vias on the die). Those dies are good for fine-tune the basic steps for MOS and bipolar devices. Later then, we can stream out the metcap mask (leaving all other masks unchanged) and add the two extra layers to the processing. I plan to finish the capacitor layout until Friday latest. What do you think? Regards, Ferenc
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Éger Ferenc