Hi list I've been looking through KLayout and they have some stuff implemented in a much more performant fashion than I did. The question is: Do we wanna drag in their code into QtFlow or maybe integrate our stuff as plugin into KLayout? Please give feedback on that.
Also please have a look on the process, which I think is plus-minus done so far and ready for testing: https://github.com/libresilicon/process/blob/master/process_steps/process_st...
Please come into Mumble this Sunday 9pm HKT and give your feedback on the process!
Thanks David
David Lanzendörfer schreef op wo 20-06-2018 om 23:17 [+0800]:
Hi list I've been looking through KLayout and they have some stuff implemented in a much more performant fashion than I did. The question is: Do we wanna drag in their code into QtFlow or maybe integrate our stuff as plugin into KLayout? Please give feedback on that.
Also please have a look on the process, which I think is plus-minus done so far and ready for testing: https://github.com/libresilicon/process/blob/master/process_steps/process_st...
I see you are using a hard mask for well and diffusion implants. As far as I can remember the resist itself is used as stopping layer for the implants and you don't need the extra steps for the hard masks. And I do think they are even thicker than the hard mask you are using.
greets, Staf.
Hi Staf What do you think about making two versions of the document? In one we explore the method of doping by using infusion and hard mask, in the other one we use implantation and resist?
like... process_steps_implant.pdf and process_steps_diffusion.pdf
Cheers David
On Thursday, 21 June 2018 1:39:23 AM HKT Staf Verhaegen wrote:
I see you are using a hard mask for well and diffusion implants. As far as I can remember the resist itself is used as stopping layer for the implants and you don't need the extra steps for the hard masks. And I do think they are even thicker than the hard mask you are using.
Hi David, I do think it makes sense to look at both possibilities. How you document these things, I leave that up to you guys.Staf.
David Lanzendörfer schreef op zo 24-06-2018 om 14:28 [+0800]:
Hi Staf What do you think about making two versions of the document? In one we explore the method of doping by using infusion and hard mask, in the other one we use implantation and resist?
like... process_steps_implant.pdf and process_steps_diffusion.pdf
Cheers David
On Thursday, 21 June 2018 1:39:23 AM HKT Staf Verhaegen wrote:
I see you are using a hard mask for well and diffusion implants. As far as I can remember the resist itself is used as stopping layer for the implants and you don't need the extra steps for the hard masks. And I do think they are even thicker than the hard mask you are using.
libresilicon-developers@list.libresilicon.com
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David Lanzendörfer -
Staf Verhaegen