Hi Staf Now I'm getting what you're trying to tell me! Good point!
However. Double patterning is possible in this way: https://www.techdesignforums.com/practice/guides/double-patterning/
This already gives us the possibility to squeeze a bit more resolution out of the stepper. Right?
Cheers -lev
On Saturday, April 11, 2020 12:29:08 PM WEST Staf Verhaegen wrote:
What I do want to say is that it will neither work for DMD as for physical masks. You can't increase resolution by doing two prints in a resist over the resolution you can get with a single print in that same resist. There have been tries to make the resist non-linear by doing a bake step in between the two exposures but this causes asymmetry in sensitivity to the image between the two exposures and has not made it in production AFAIK. AFAIK, only techniques where the first print is developed in resist and then transferred through etch in a mask layer and then doing a second exposure in a fresh resist layer has made it in production.