Hi
Wow, we dig deeper in technology stuff, as I assumed..
Of course! We're developing our own process! ;-) So what do you think? Should we just use a polysilicon strip for now, in order to make sure that our gate is aligned? As soon as we scale down, we can still throw some Titanium at it during as a shoved in process substep, bake it in and make Titanium-polycid for reducing the resistance.
On 03/07/2018 02:47 PM, David Lanzendörfer wrote:
This patent contains some hints on how to build our polysilicon gates with low resistance: -> https://patents.google.com/patent/US6387788
Well, google also said the patent is "Expired - Fee Related". Means, we can use it, right?
I guess so... Cedric is also here on the mailinglist, he's our legal protector (among many other very important taks), and he already has given me the task to collect a list of all the patents we're touching, so that he can make sure, that we're on the safe side from a legal perspective.
BTW, avoiding patents always means "know your enemy".
Well. Better we know that we do something like someone else. It's wise to google your approach before you start manufacuting products in a certain way and try to sell them. Because even if you didn't know that the method has been patented, it is and the patent holder might sue the shit out of us. So it's better to check whether the patent is still on, and if yes, choose another approach :-)
@David, can you please provide somewhere in the wiki a list of patents we are aware (and avoiding)? Just to document we know them and keep them out of the way.
I will extract all the footnotes from the LaTeX document and filter them for patents, yeah :-)
Cheers David