On Fri, Apr 10, 2020 at 8:37 PM David Lanzendörfer leviathan@libresilicon.com wrote:
Hi everyone So last Sunday, Ferenc and I brainstormed on how to achieve smaller feature sizes with a UV wave length, which limits us to 400nm or so. We discussed splitting a lower feature size layout into multiple masks and then doing overlapping exposure steps. Ferenc pointed out, that we might run into an offset issue. I've been thinking about this for a while and the solution came to me on the toilet just now, and it's actually surprisingly simple. Since we're using a DMD and not physical masks, we can do the multiple exposure steps all at once, without any stepping in between.
while(!eow()) { // end of wafer expose_mask(1); expose_mask(2); step_to_next(); }
https://www.youtube.com/watch?v=n-_D-cVIsLk
cheers -lev_______________________________________________ Libresilicon-developers mailing list Libresilicon-developers@list.libresilicon.com https://list.libresilicon.com/mailman/listinfo/libresilicon-developers