Hi I'm reworking the transistor characteristics formulas during the next few days, because if you look at the wxMaxima worksheets and plot the threshold functions, they seem to be kind of off... Which means, I'll literally go over the books again there and see what I'm doing wrong. I've got some suspicions, but I postpone that, so that I can get some sleep before the sun comes out again ^^'
@Staf: I've now removed the etching step for the hard mask removal and replaced it with a CMP step. The machine I've linked in the step can polish away nitride and oxide at once.
Cheers David