Hello David.
On 7/9/19 2:39 PM, David Lanzendörfer wrote:
Hi everyone So I've had a mail exchange and we can go through our recent status together with the engineers at RCL, as soon as we're done cleaning up everything.
Tasks:
a) We've gotta rework PearlRiver, so that it's in accordance with the new design rules which arose from the R&D. Mainly: Contact holes should all have the same size because the dry etching time is varying with the area of the contact hole. So the yield goes into the basement when the vias/contacts in the oxide all have different dimensions.
Do we already have the updated scmos.tech file for Magic somewhere? I like to evaluate the new (minimum) cell layout with right DRC rules.
b) Also I'm right now cleaning up the documentation for the process so that it reflects what I've actually done the past year in the lab.
Great! Go ahead :-)
c) After we're done with it, we'll do some legal stuff and can most likely make a test run.
Sounds great. Hope, we are soon ready to show next GDS2 for the PearlRiver.
Hagen.