Hi The progress in the lab is slowed down by machines, which already have been booked and yesterday, it took me half an hour until someone told me, that the cooler for the Poly dry etcher wasn't broken, but the pump just turned off from now on, when not being in use, because I'm essentially the only person etching polysilicon, because no one else works on a CMOS process at NFF... ^^'
Anyway. I'm now so far, that we've got the new poly gates on a STI isolated surface: https://twitter.com/LibreSilicon/status/1126815745734692864
On Monday it's Buddhas birthday, so the lab is closed... again... Hong Kong. Those folks have so many holidays... If I wouldn't be here already, I'd be jealous =^_^=~~
Tuesday I'll attend the formal training for the Cirie200 (nickel dry etch machine), as well as finalize implant stop, nimplant, pimplant, annealing, nitride spacers + silicide block, and then I put it into the furnace for LTO deposition.
After LTO, I can etch the contact holes and sputter Nickel+Aluminum+Nickel.
Now that I anyway have to sputter and dry etch Nickel, I decided, that I use Nickel instead of Titanium for the interface layers. This will reduce the via resistance by a factor 10.
Cheers David
Hi And I just realized that it might not be obvious to some, what this email has to do with ESD protection. So I'll elaborate a bit.
Tuesday I'll attend the formal training for the Cirie200 (nickel dry etch machine), as well as finalize implant stop, nimplant, pimplant, annealing, nitride spacers + silicide block, and then I put it into the furnace for LTO deposition.
implant stop and silicide block are the two steps additionally required, for building Zener polysilicon diodes.
When I've got the diode curves from those test structures, we can built a rudimentary ESD protection into the bonding pads, which will allow us to wire bonding the diced dies without frying them.
Cheers David
On Sat, May 11, 2019 at 7:48 AM David Lanzendörfer david.lanzendoerfer@lanceville.cn wrote:
Hi And I just realized that it might not be obvious to some, what this email has to do with ESD protection. So I'll elaborate a bit.
Thanks. This elaboration helps.
Tuesday I'll attend the formal training for the Cirie200 (nickel dry etch machine), as well as finalize implant stop, nimplant, pimplant, annealing, nitride spacers + silicide block, and then I put it into the furnace for LTO deposition.
implant stop and silicide block are the two steps additionally required, for building Zener polysilicon diodes.
When I've got the diode curves from those test structures, we can built a rudimentary ESD protection into the bonding pads, which will allow us to wire bonding the diced dies without frying them.
Cheers David_______________________________________________ Libre-silicon-devel mailing list Libre-silicon-devel@list.libresilicon.com http://list.libresilicon.com/mailman/listinfo/libre-silicon-devel
Hi all So today I finished the nitride spacers, but because the dry etcher had problems again, it took me until 18.30h, until I finally was done and left the lab. Tomorrow I try to pull another stunt like this and get the silicide formation and LTO done. Maybe I even can manage to etch the wires, but it's many steps left, and I'm not sure I get it all done tomorrow.
Just a little update.
Cheers -lev
Hi all So the wafer is now in the furnace, depositing LTO. Unfortunately it will only be done around 5pm where I can't enter the lab anymore :-( On Monday, when I get it back, I will etch the oxide holes and sputter the nickel first thing in the morning. Those damn holidays really did cost me a day. If the lab would have been open on Monday, I would be done now... Anyway
Cheers -lev
Hi all So today I finished the nitride spacers, but because the dry etcher had problems again, it took me until 18.30h, until I finally was done and left the lab. Tomorrow I try to pull another stunt like this and get the silicide formation and LTO done. Maybe I even can manage to etch the wires, but it's many steps left, and I'm not sure I get it all done tomorrow.
Just a little update.
Cheers -lev
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